Deposition of La2Zr2O7 film by chemical solution deposition
نویسندگان
چکیده
منابع مشابه
Highly oriented LiFePO4 thin film electrodes via chemical solution deposition
Highly oriented LiFePO4 thin-film electrodes were fabricated via chemical solution deposition combined with spin coating. The effects of the precursor concentrations and types of substrates on microstructures and electrochemical performances were studied. Single-phase LiFePO4 with orientations perpendicular to the (211)/(020) and (311) planes prepared using stainless steel as substrate presents...
متن کاملThick Film Deposition of Carbon Nanotubes by Alternating Electrophoresis
Electrophoretic deposition of carbon nanotubes (CNTs) using alternating current electric fields (0.01-1000 Hz) is reported. Pure acetone was used as suspending medium. Two parallel gold electrodes were used as depositing substrate. The effect of depositing parameters such as frequency and three waveforms (sinusoidal, rectangular and triangular) on deposit yield was investigated. According to ou...
متن کاملSynthesis of Boron-Aluminum Nitride Thin Film by Chemical Vapour Deposition Using Gas Bubbler
Boron included aluminium nitride (B-AlN) thin films were synthesized on silicon (Si) substrates through chemical vapour deposition ( CVD ) at 773 K (500 °C). tert-buthylamine (tBuNH2) solution was used as nitrogen source and delivered through gas bubbler. B-AlN thin films were prepared on Si-100 substrates by varying gas mixture ratio of three precursors. The structural properties of the films ...
متن کاملBiVO4 thin film photoanodes grown by chemical vapor deposition.
BiVO4 thin film photoanodes were grown by vapor transport chemical deposition on FTO/glass substrates. By controlling the flow rate, the temperatures of the Bi and V sources (Bi metal and V2O5 powder, respectively), and the temperature of the deposition zone in a two-zone furnace, single-phase monoclinic BiVO4 thin films can be obtained. The CVD-grown films produce global AM1.5 photocurrent den...
متن کاملGas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations
Mewlude Imam, Konstantin Gaul, Andreas Stegmueller, Carina Höglund, Jens Jensen, Lars Hultman, Jens Birch, Ralf Tonner and Henrik Pedersen, Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations, 2015, Journal of Materials Chemistry C, (3), 41, 10898-10906. http://dx.doi.org/10.1039/c5tc02293b Copyright: Royal...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Sol-Gel Science and Technology
سال: 2010
ISSN: 0928-0707,1573-4846
DOI: 10.1007/s10971-010-2204-y